Atomic scale enhancement of the adhesion of beryllium films to carbon substrates

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We have used 200 keV carbon ions to enhance the adhesion of 240-nm thick Be films to polished, vitreous carbon substrates. Adhesion of the as-deposited films was below that necessary to pass the scotch-tape test. Carbon ion fluences less than 1.6x10{sup 14} C/cm{sup 2} were sufficient to ensure the passage of the tape test without affecting the optical properties of the films. Adhesion failure of the as-deposited film was attributed to an inner oxide layer between the Be and the carbon. Because this oxide ({approximately}5 nm of BeO) was not measurably changed by the irradiation process, these results are consistent ... continued below

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8 p.

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Musket, R.G. & Wirtenson, G.R. December 1, 1995.

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We have used 200 keV carbon ions to enhance the adhesion of 240-nm thick Be films to polished, vitreous carbon substrates. Adhesion of the as-deposited films was below that necessary to pass the scotch-tape test. Carbon ion fluences less than 1.6x10{sup 14} C/cm{sup 2} were sufficient to ensure the passage of the tape test without affecting the optical properties of the films. Adhesion failure of the as-deposited film was attributed to an inner oxide layer between the Be and the carbon. Because this oxide ({approximately}5 nm of BeO) was not measurably changed by the irradiation process, these results are consistent with adhesion enhancement occurring on the atomic scale at the interface between the inner oxide and the carbon substrate. This conclusion was supported by Rutherford backscattering (RBS) data, and potential adhesion mechanisms are discussed with consideration of relative contributions from electronic and nuclear stopping.

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8 p.

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OSTI as DE96009323

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  • Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995

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  • Other: DE96009323
  • Report No.: UCRL-JC--117647
  • Report No.: CONF-951155--117
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 226413
  • Archival Resource Key: ark:/67531/metadc672981

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  • December 1, 1995

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  • June 29, 2015, 9:42 p.m.

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  • Feb. 16, 2016, 2:29 p.m.

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Musket, R.G. & Wirtenson, G.R. Atomic scale enhancement of the adhesion of beryllium films to carbon substrates, article, December 1, 1995; California. (digital.library.unt.edu/ark:/67531/metadc672981/: accessed December 15, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.