A two-dimensional numerical model of gas mixing and deposition in a rotating disk CVD reactor

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Description

Gas phase transport with mixing and surface chemistry is studied in an axisymmetric, isothermal rotating disk chemical vapor deposition reactor. A simple one-step surface reaction is used to model deposition of gallium on the rotating surface. Partitioning of the inlet flow into separate gas streams of different species can lead to nonuniform deposition on the growth surface. The nonuniformity is caused by incomplete radial diffusion of gas species; depending on reactor temperature and pressure it can be worsened by large buoyant flow instabilities. The nonuniformity is relatively insensitive to the magnitude of the specified sticking coefficient.

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6 p.

Creation Information

Winters, W.S.; Evans, G.H. & Greif, R. April 1, 1996.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Gas phase transport with mixing and surface chemistry is studied in an axisymmetric, isothermal rotating disk chemical vapor deposition reactor. A simple one-step surface reaction is used to model deposition of gallium on the rotating surface. Partitioning of the inlet flow into separate gas streams of different species can lead to nonuniform deposition on the growth surface. The nonuniformity is caused by incomplete radial diffusion of gas species; depending on reactor temperature and pressure it can be worsened by large buoyant flow instabilities. The nonuniformity is relatively insensitive to the magnitude of the specified sticking coefficient.

Physical Description

6 p.

Notes

OSTI as DE96009788

Source

  • 189. meeting of the Electrochemical Society (ECS), Los Angeles, CA (United States), 5-10 May 1996

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  • Other: DE96009788
  • Report No.: SAND--96-8555C
  • Report No.: CONF-960502--8
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 226425
  • Archival Resource Key: ark:/67531/metadc672760

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • April 1, 1996

Added to The UNT Digital Library

  • June 29, 2015, 9:42 p.m.

Description Last Updated

  • April 14, 2016, 7:12 p.m.

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Winters, W.S.; Evans, G.H. & Greif, R. A two-dimensional numerical model of gas mixing and deposition in a rotating disk CVD reactor, article, April 1, 1996; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc672760/: accessed October 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.