Laser-induced reactions in a deep UV resist system: Studied with picosecond infrared spectroscopy

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One of the most technologically important uses of organic photochemistry is in the imaging industry where radiation-sensitive organic monomers and polymers are used in photoresists. A widely-used class of compounds for imaging applications are diazoketones; these compounds undergo a photoinduced Wolff rearrangement to form a ketene intermediate which subsequently hydrolyses to a base-soluble, carboxylic acid. Another use of organic molecules in polymer matrices is for dopant induced ablation of polymers. As part of a program to develop diagnostics for laser driven reactions in polymer matrices, we have investigated the photoinduced decomposition of 5-diazo-2,2-dimethyl-1,3-dioxane-4,6-dione (5-diazo Meldrum`s acid, DM) in a PMMA ... continued below

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7 p.

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Lippert, T.; Koskelo, A. & Stoutland, P.O. December 31, 1995.

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One of the most technologically important uses of organic photochemistry is in the imaging industry where radiation-sensitive organic monomers and polymers are used in photoresists. A widely-used class of compounds for imaging applications are diazoketones; these compounds undergo a photoinduced Wolff rearrangement to form a ketene intermediate which subsequently hydrolyses to a base-soluble, carboxylic acid. Another use of organic molecules in polymer matrices is for dopant induced ablation of polymers. As part of a program to develop diagnostics for laser driven reactions in polymer matrices, we have investigated the photoinduced decomposition of 5-diazo-2,2-dimethyl-1,3-dioxane-4,6-dione (5-diazo Meldrum`s acid, DM) in a PMMA matrix using picosecond infrared spectroscopy. In particular, irradiation of DM with a 60 ps 266 nm laser pulse results in immediate bleaching of the diazo infrared band ({nu} = 2172 cm{sup -1}). Similarly, a new band appears within our instrument response at 2161 cm{sup -1} (FWHM = 29 cm{sup -1}) and is stable to greater than 6 ns.; we assign this band to the ketene photoproduct of the Wolff rearrangement. Using deconvolution techniques we estimate a limit for its rate of formation of {tau} < 20 ps. The linear dependence of the absorbance change with the pump power (266 nm) even above the threshold of ablation suggest that material ejection take place after 6ns.

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7 p.

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OSTI as DE96007690

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  • Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995

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  • Other: DE96007690
  • Report No.: LA-UR--95-4383
  • Report No.: CONF-951155--56
  • Grant Number: W-7405-ENG-36
  • Office of Scientific & Technical Information Report Number: 212426
  • Archival Resource Key: ark:/67531/metadc671868

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  • December 31, 1995

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  • June 29, 2015, 9:42 p.m.

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  • Feb. 29, 2016, 9:30 p.m.

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Lippert, T.; Koskelo, A. & Stoutland, P.O. Laser-induced reactions in a deep UV resist system: Studied with picosecond infrared spectroscopy, article, December 31, 1995; New Mexico. (digital.library.unt.edu/ark:/67531/metadc671868/: accessed October 22, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.