A reaction mechanism for titanium nitride CVD from TiCl{sub 4} and NH{sub 3}

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A gas-phase and surface reaction mechanism for the CVD of TiN from TiCl{sub 4} and NH{sub 3} is proposed. The only gas-phase process is complex formation, which can compete with deposition. The surface mechanism postulates the stepwise elimination of Cl and H atoms from TiCl{sub 4} and NH{sub 3}, respectively, to form solid TiN and gaseous HCl. The mechanism also accounts for the change in oxidation state of Ti by allowing for liberation of N{sub 2}. Provided that the surface composition is at steady state, the stoichiometry of the overall reaction is reproduced exactly. In addition, the global kinetic law ... continued below

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18 p.

Creation Information

Larson, R. S. & Allendorf, M. D. December 1995.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 91 times , with 11 in the last month . More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Livermore, CA (United States)
    Place of Publication: Livermore, California

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Description

A gas-phase and surface reaction mechanism for the CVD of TiN from TiCl{sub 4} and NH{sub 3} is proposed. The only gas-phase process is complex formation, which can compete with deposition. The surface mechanism postulates the stepwise elimination of Cl and H atoms from TiCl{sub 4} and NH{sub 3}, respectively, to form solid TiN and gaseous HCl. The mechanism also accounts for the change in oxidation state of Ti by allowing for liberation of N{sub 2}. Provided that the surface composition is at steady state, the stoichiometry of the overall reaction is reproduced exactly. In addition, the global kinetic law predicted by the mechanism is successfully fit to new deposition data from a rotating disk reactor and is shown to be consistent with literature results.

Physical Description

18 p.

Notes

OSTI as DE96006535

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  • 13. international conference on chemical vapor deposition, Los Angeles, CA (United States), 5-10 May 1996

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  • Other: DE96006535
  • Report No.: SAND--96-8443
  • Report No.: CONF-9605110--1
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 206872
  • Archival Resource Key: ark:/67531/metadc669389

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • December 1995

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  • June 29, 2015, 9:42 p.m.

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  • Dec. 3, 2015, 6:35 p.m.

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Larson, R. S. & Allendorf, M. D. A reaction mechanism for titanium nitride CVD from TiCl{sub 4} and NH{sub 3}, article, December 1995; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc669389/: accessed April 24, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.