HFCVD of diamond at low substrate and low filament temperatures

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It has been discovered that the addition of a small amount of oxygen to the CH{sub 4} and H{sub 2} feed gas permits HFCVD of diamond at significantly lower filament and substrate temperatures. The effective O/C ratio here is much lower than that used in most studies of the oxygen effect. Careful control of the O/C and C/H ratios were found to be crucial to success. The effects of substrate and filament temperatures on growth rate and film quality were studied. Optimum conditions were found that gave reasonable growth rates ( {approximately}0.5 {mu}m/h ) with high film quality at filament ... continued below

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8 p.

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Tolt, Z. L.; Heatherly, L.; Clausing, R. E.; Shaw, R. W. & Feigerle, C. S. March 8, 1995.

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Description

It has been discovered that the addition of a small amount of oxygen to the CH{sub 4} and H{sub 2} feed gas permits HFCVD of diamond at significantly lower filament and substrate temperatures. The effective O/C ratio here is much lower than that used in most studies of the oxygen effect. Careful control of the O/C and C/H ratios were found to be crucial to success. The effects of substrate and filament temperatures on growth rate and film quality were studied. Optimum conditions were found that gave reasonable growth rates ( {approximately}0.5 {mu}m/h ) with high film quality at filament temperatures below 1750{degrees}C and substrate temperatures below 600C. As a result, low temperature deposition has been realized. Power consumption can be reduced 50%, and the filament lifetime is extended indefinitely.

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8 p.

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OSTI as DE96004198

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  • International conference on applications of diamond films and related materials, Gaithersburg, MD (United States), 21-24 Aug 1995

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  • Other: DE96004198
  • Report No.: CONF-950840--5
  • Grant Number: AC05-84OR21400
  • Office of Scientific & Technical Information Report Number: 204129
  • Archival Resource Key: ark:/67531/metadc669087

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • March 8, 1995

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  • June 29, 2015, 9:42 p.m.

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  • Dec. 1, 2015, 9:40 a.m.

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Tolt, Z. L.; Heatherly, L.; Clausing, R. E.; Shaw, R. W. & Feigerle, C. S. HFCVD of diamond at low substrate and low filament temperatures, article, March 8, 1995; Tennessee. (digital.library.unt.edu/ark:/67531/metadc669087/: accessed October 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.