A new application for x-ray lithography: Fabrication of blazed diffractive optical elements with a deep phase profile

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Use of x-ray lithography to produce blazed diffractive optical elements (DOEs) is described. Proposed method allows one to make highly efficient blazed DOE with a deep phase profile (ten wavelengths and more) using a single x-ray mask with a binary transmission pattern. Unlike the well-known multilevel DOEs, blazed ones do not involve fabrication and aligning of a set of masks. DOEs with a profile depth of 10 {mu}m and more and zone sizes down to 1 {mu}m can be obtained due to the short wavelength and high penetrability of x rays. The first experimental samples of blazed DOEs with a ... continued below

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7 p.

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Makarov, O.A.; Chen, Zheng; Krasnoperova, A.A.; Cerrina, F.; Cherkashin, V.V.; Poleshchuk, A.G. et al. April 1, 1996.

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Description

Use of x-ray lithography to produce blazed diffractive optical elements (DOEs) is described. Proposed method allows one to make highly efficient blazed DOE with a deep phase profile (ten wavelengths and more) using a single x-ray mask with a binary transmission pattern. Unlike the well-known multilevel DOEs, blazed ones do not involve fabrication and aligning of a set of masks. DOEs with a profile depth of 10 {mu}m and more and zone sizes down to 1 {mu}m can be obtained due to the short wavelength and high penetrability of x rays. The first experimental samples of blazed DOEs with a 10 {mu}m-height profile--lenses and gratings - were fabricated by x-ray lithography with synchrotron radiation using the x-ray masks, prepared in accordance with the pulse-width modulation algorithm. Diffraction efficiency for lenses was measured for white light: it is higher than 80% for the central part of the lenses (inside a 10 mm diameter) and about 60% for an area of 20 mm diameter.

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7 p.

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OSTI as DE96009050

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  • 1996 International Society for Optical Engineering (SPIE) international symposium on microlithography, Santa Clara, CA (United States), 11-15 Mar 1996

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  • Other: DE96009050
  • Report No.: ANL/XFD/CP--89660
  • Report No.: CONF-9603140--2
  • Grant Number: W-31109-ENG-38
  • Office of Scientific & Technical Information Report Number: 219170
  • Archival Resource Key: ark:/67531/metadc669052

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  • April 1, 1996

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  • June 29, 2015, 9:42 p.m.

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  • Dec. 16, 2015, 12:59 p.m.

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Makarov, O.A.; Chen, Zheng; Krasnoperova, A.A.; Cerrina, F.; Cherkashin, V.V.; Poleshchuk, A.G. et al. A new application for x-ray lithography: Fabrication of blazed diffractive optical elements with a deep phase profile, article, April 1, 1996; Illinois. (digital.library.unt.edu/ark:/67531/metadc669052/: accessed September 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.