Characterization of SAL605 negative resist at {lambda}=13 nm

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Description

We have characterized the response of the negative resist SAL605 in the extreme ultraviolet ({lambda}=13 nm). The sensitivity was found to be {approx}1 mJ/cm{sup 3} for all conditions studied. We have identified processing conditions leading to high ({gamma}{gt}4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.

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5 p.

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La Fontaine, B.; Ciarlo, D.; Gaines, D.P. & Kania, D.R. May 24, 1996.

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Description

We have characterized the response of the negative resist SAL605 in the extreme ultraviolet ({lambda}=13 nm). The sensitivity was found to be {approx}1 mJ/cm{sup 3} for all conditions studied. We have identified processing conditions leading to high ({gamma}{gt}4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.

Physical Description

5 p.

Notes

OSTI as DE96012224

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  • Optical Society of America (OSA) meeting on integrated photonics research, Boston, MA (United States), 29 Apr - 3 May 1996

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  • Other: DE96012224
  • Report No.: UCRL-JC--123012
  • Report No.: CONF-960493--14
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 251202
  • Archival Resource Key: ark:/67531/metadc668339

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  • May 24, 1996

Added to The UNT Digital Library

  • June 29, 2015, 9:42 p.m.

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  • Feb. 23, 2016, 3:59 p.m.

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La Fontaine, B.; Ciarlo, D.; Gaines, D.P. & Kania, D.R. Characterization of SAL605 negative resist at {lambda}=13 nm, article, May 24, 1996; California. (digital.library.unt.edu/ark:/67531/metadc668339/: accessed August 21, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.