Plasma source ion implantation of ammonia into electroplated chromium Page: 1 of 8
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3 41.
Title:
Author(s):
Submitted to:Plasma Source Ion Implantation of Ammonia Into
Electroplated ChromiumJ.
K.
J.
D.
M.T. Scheuer
C. Walter
P. Blanchard
J. Rej
NastasiTMS Annual Meeting
NASTER
,~rr ' h V a_ r 1February 12-16, 1995
Las Vegas, NevadaLos Alamos
NATIONAL LABORATORY _________________________
Los Alamos National Laboratory, an affirmative actioniequal opportunity employer. is operated by the University of California for the U.S. Department of Energy
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requests that Ine publisher identify this article as worx performed under the auspices of the U.S. Department of Energy.
DISTRIBUTION OF THIS DOCUMENP- IS UNLIMrr=n 35 Fo 26LA-UR- 9 5
Gnfg5oat I - - Y
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Scheuer, J. T.; Walter, K. C.; Blanchard, J. P.; Rej, D. J. & Nastasi, M. Plasma source ion implantation of ammonia into electroplated chromium, report, February 1, 1995; New Mexico. (https://digital.library.unt.edu/ark:/67531/metadc668038/m1/1/?rotate=90: accessed April 19, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.