Plasma source ion implantation of ammonia into electroplated chromium

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Description

Ammonia gas (NH{sub 3}) has been used as a nitrogen source for plasma source ion implantation processing of electroplated chromium. No evidence was found of increased hydrogen concentrations in the bulk material, implying that ammonia can be used without risking hydrogen embrittlement. The retained nitrogen dose of 2.1 {times} 10{sup 17} N-at/cm{sup 2} is sufficient to increase the surface hardness of electroplated Cr by 24% and decrease the wear rate by a factor of 4.

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7 p.

Creation Information

Scheuer, J.T.; Walter, K.C.; Rej, D.J.; Nastasi, M. & Blanchard, J.P. February 1, 1995.

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Description

Ammonia gas (NH{sub 3}) has been used as a nitrogen source for plasma source ion implantation processing of electroplated chromium. No evidence was found of increased hydrogen concentrations in the bulk material, implying that ammonia can be used without risking hydrogen embrittlement. The retained nitrogen dose of 2.1 {times} 10{sup 17} N-at/cm{sup 2} is sufficient to increase the surface hardness of electroplated Cr by 24% and decrease the wear rate by a factor of 4.

Physical Description

7 p.

Notes

INIS; OSTI as DE95006275

Source

  • Annual meeting and exhibition of the Minerals, Metals and Materials Society (TMS), Las Vegas, NV (United States), 12-16 Feb 1995

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  • Other: DE95006275
  • Report No.: LA-UR--95-341
  • Report No.: CONF-950201--4
  • Grant Number: W-7405-ENG-36
  • DOI: 10.2172/28338 | External Link
  • Office of Scientific & Technical Information Report Number: 28338
  • Archival Resource Key: ark:/67531/metadc668038

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • February 1, 1995

Added to The UNT Digital Library

  • June 29, 2015, 9:42 p.m.

Description Last Updated

  • March 2, 2016, 1:26 p.m.

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Scheuer, J.T.; Walter, K.C.; Rej, D.J.; Nastasi, M. & Blanchard, J.P. Plasma source ion implantation of ammonia into electroplated chromium, report, February 1, 1995; New Mexico. (digital.library.unt.edu/ark:/67531/metadc668038/: accessed October 21, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.