MOCVD of very thin films of lead lanthanum titanate

PDF Version Also Available for Download.

Description

Films of lead lanthanum titanate were deposited using metal-organic chemical vapor deposition (MOCVD) at temperatures between 500 and 550{degrees}C in a hot-wall reactor. The precursors used were Pb(THD){sub 2}, La(THD){sub 3}, and Ti(THD){sub 2}(I-OPr){sub 2} where THD = 2,2,6,6-tetramethyl-3,5-heptanedionate, O{sub 2}C{sub 11}H{sub 19}, and I-OPr = isopropoxide, OC{sub 3}H{sub 7}. The three precursors were delivered to the reactor using a single solution containing all three precursors dissolved in tetraglyme and the precursor solution was volatilized at 225{degrees}C. Films were deposited on Si and Si/Ti/Pt substrates, and characterized using Rutherford Backscattering Spectroscopy (RPS) and X-ray diffraction(XRD). Films deposited at 550{degrees}C had ... continued below

Physical Description

6 p.

Creation Information

Beach, D.B. & Vallet, C.E. December 31, 1995.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

Who

People and organizations associated with either the creation of this article or its content.

Sponsor

Publisher

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this article. Follow the links below to find similar items on the Digital Library.

Description

Films of lead lanthanum titanate were deposited using metal-organic chemical vapor deposition (MOCVD) at temperatures between 500 and 550{degrees}C in a hot-wall reactor. The precursors used were Pb(THD){sub 2}, La(THD){sub 3}, and Ti(THD){sub 2}(I-OPr){sub 2} where THD = 2,2,6,6-tetramethyl-3,5-heptanedionate, O{sub 2}C{sub 11}H{sub 19}, and I-OPr = isopropoxide, OC{sub 3}H{sub 7}. The three precursors were delivered to the reactor using a single solution containing all three precursors dissolved in tetraglyme and the precursor solution was volatilized at 225{degrees}C. Films were deposited on Si and Si/Ti/Pt substrates, and characterized using Rutherford Backscattering Spectroscopy (RPS) and X-ray diffraction(XRD). Films deposited at 550{degrees}C had a composition which was close to that of the precursor solution while films deposited at 500{degrees}C were deficient in lanthanum. Even at 500{degrees}C, the desired perovskite phase showed an increase in the intensity of the X-ray lines, but did not change the width of these lines, implying the grain sizes had remained unchanged.

Physical Description

6 p.

Notes

OSTI as DE96008613

Source

  • Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995

Language

Item Type

Identifier

Unique identifying numbers for this article in the Digital Library or other systems.

  • Other: DE96008613
  • Report No.: CONF-951155--104
  • Grant Number: AC05-96OR22464
  • Office of Scientific & Technical Information Report Number: 230282
  • Archival Resource Key: ark:/67531/metadc667879

Collections

This article is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

What responsibilities do I have when using this article?

When

Dates and time periods associated with this article.

Creation Date

  • December 31, 1995

Added to The UNT Digital Library

  • June 29, 2015, 9:42 p.m.

Description Last Updated

  • Jan. 22, 2016, 12:13 p.m.

Usage Statistics

When was this article last used?

Yesterday: 0
Past 30 days: 0
Total Uses: 3

Interact With This Article

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

International Image Interoperability Framework

IIF Logo

We support the IIIF Presentation API

Beach, D.B. & Vallet, C.E. MOCVD of very thin films of lead lanthanum titanate, article, December 31, 1995; Tennessee. (digital.library.unt.edu/ark:/67531/metadc667879/: accessed December 12, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.