Aminodisilanes as silylating agents for dry-developed positive-tone resists for extreme ultraviolet (13.5) microlithography

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We recently described a near-surface imaging scheme that employs disilanes and a bilayer resist scheme which together dramatically improve silicon contrast. A relatively thin 0.25 to 0.1 {mu}m imaging layer of a chemically amplified photo-crosslinking resist (Shipley XP-8844 or XP-9472) is spin coated on top of a thicker (0.25-0.5 {mu}m) layer of hard-baked resist (such as Shipley MP-1807). This bilayer scheme improves silicon contrast and provides additional advantages such as providing a planarizing layer and a processing layer.

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2 p.

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Wheeler, D.; Kubiak, G.; Henderson, C. & Ray-Chadhuri, A. February 1, 1996.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

We recently described a near-surface imaging scheme that employs disilanes and a bilayer resist scheme which together dramatically improve silicon contrast. A relatively thin 0.25 to 0.1 {mu}m imaging layer of a chemically amplified photo-crosslinking resist (Shipley XP-8844 or XP-9472) is spin coated on top of a thicker (0.25-0.5 {mu}m) layer of hard-baked resist (such as Shipley MP-1807). This bilayer scheme improves silicon contrast and provides additional advantages such as providing a planarizing layer and a processing layer.

Physical Description

2 p.

Notes

OSTI as DE96005899

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  • Optical Society of America (OSA) topical meeting on extreme ultraviolet lithography, Boston, MA (United States), 1-3 May 1996

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  • Other: DE96005899
  • Report No.: SAND--96-0333C
  • Report No.: CONF-960590--1
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 220595
  • Archival Resource Key: ark:/67531/metadc666745

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  • February 1, 1996

Added to The UNT Digital Library

  • June 29, 2015, 9:42 p.m.

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  • April 14, 2016, 2:46 p.m.

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Wheeler, D.; Kubiak, G.; Henderson, C. & Ray-Chadhuri, A. Aminodisilanes as silylating agents for dry-developed positive-tone resists for extreme ultraviolet (13.5) microlithography, article, February 1, 1996; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc666745/: accessed December 13, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.