In situ pre-growth calibration using reflectance as a control strategy for MOCVD fabrication of device structures Page: 1 of 28
This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided to UNT Digital Library by the UNT Libraries Government Documents Department.
Extracted Text
The following text was automatically extracted from the image on this page using optical character recognition software:
comF- 9&o ! 3-A-
INSITU PRE-GROWTH CALIBRATION USING REFLECTANCE AS A
CONTROL STRATEGY FOR MOCVD FABRICATION OF DEVICE
STRUCTURES
William G. Breiland, Hong Q. Hou, Herman C. Chui*, and Burrel E.
Hammons
R
Sandia National Laboratories, Albuquerque, NM 87185-0601ECI
UL.proofs to:
W. G. Breiland
Dept 1126, MS0601
Sandia National Laboratories
Albuquerque, NM 87185-0601
wgbreil@sandia.gov
(505)844-7029 FAX: (505)844-3211
PACS: 7.60.Hv, 81.15.Gh, 85.60-q
Keywords: MOCVD, reflectance, in situ, virtual interface, VCSEL
Abstract
In situ normal incidence reflectance, combined with a virtual interface model, is being used
routinely on a commercial MOCVD reactor to measure growth rates of compound
semiconductor films. The technique serves as a pre-growth calibration tool analogous to
the use of RHEED in MBE as well as a real-time monitor throughout the run. An
application of the method to the growth of a vertical cavity surface emitting laser
(VCSEL) device structure is presented. All necessary calibration information can be
obtained using a single run lasting less than one hour. Working VCSEL devices are
obtained on the first try after calibration. Repeated runs have yielded 0.3%
reproducibility of the Fabry-Perot cavity wavelength over the course of more than 100
runs.EIVED
3a
ST I 9Oi6TRIBUTION OF THIS DOCUMENT IS UNUMTED
MASTER/V' N -/ 1 MC-
Upcoming Pages
Here’s what’s next.
Search Inside
This article can be searched. Note: Results may vary based on the legibility of text within the document.
Tools / Downloads
Get a copy of this page or view the extracted text.
Citing and Sharing
Basic information for referencing this web page. We also provide extended guidance on usage rights, references, copying or embedding.
Reference the current page of this Article.
Breiland, W.G.; Hou, H.Q.; Chui, H.C. & Hammons, B.E. In situ pre-growth calibration using reflectance as a control strategy for MOCVD fabrication of device structures, article, August 1, 1996; Albuquerque, New Mexico. (https://digital.library.unt.edu/ark:/67531/metadc664921/m1/1/: accessed April 23, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.