Energy spread of ion beams generated in multicusp ion sources

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For the production of future microelectronics devices, various alternate methods are currently being considered to replace the presently used method of lithography with ion beam lithography. One of these methods is the Ion Projection Lithography (IPL), which aims at the possibility of projecting sub-0.25 {mu}m patterns of a stencil mask onto a wafer substrate. In order to keep the chromatic aberrations below 25 nm, an ion source which delivers a beam with energy spread of less than 3 eV is desired. For this application, multicusp ion sources are being considered. We measure the longitudinal energy spread of the plasma ions ... continued below

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3 p.

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Sarstedt, M.; Herz, P. & Kunkel, W.B. April 1, 1995.

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Description

For the production of future microelectronics devices, various alternate methods are currently being considered to replace the presently used method of lithography with ion beam lithography. One of these methods is the Ion Projection Lithography (IPL), which aims at the possibility of projecting sub-0.25 {mu}m patterns of a stencil mask onto a wafer substrate. In order to keep the chromatic aberrations below 25 nm, an ion source which delivers a beam with energy spread of less than 3 eV is desired. For this application, multicusp ion sources are being considered. We measure the longitudinal energy spread of the plasma ions by using a two-grid electrostatic energy analyzer. The energy spread of the extracted beam is measured by a high-voltage retarding-field energy analyzer. In order to obtain the transverse ion temperature, a parallel-plate scanner is being set up to study the beam emittance. In this paper, comparisons are made for different ion source configurations.

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3 p.

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INIS; OSTI as DE96000189

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  • 16. Institute of Electrical and Electronic Engineers (IEEE) particle accelerator conference, Dallas, TX (United States), 1-5 May 1995

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  • Other: DE96000189
  • Report No.: LBL--37147
  • Report No.: CONF-950512--334
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 114036
  • Archival Resource Key: ark:/67531/metadc628344

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • April 1, 1995

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  • June 16, 2015, 7:43 a.m.

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  • April 5, 2016, 12:25 p.m.

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Sarstedt, M.; Herz, P. & Kunkel, W.B. Energy spread of ion beams generated in multicusp ion sources, article, April 1, 1995; California. (digital.library.unt.edu/ark:/67531/metadc628344/: accessed November 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.