Dynamics of nucleation in chemical vapor deposition

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Description

We study the evolution of layer morphology during the early stages of metal chemical vapor deposition (CVD) onto Si(100) via pyrolysis of Fe(CO){sub 5} below 250{degrees}C. Scanning tunneling microscopy (STM) shows that nuclei formation is limited by precursor dissociation which occurs on terraces, not at step sites. Also, the average size of clusters formed during CVD is larger than for Fe growth by evaporation (a random deposition process). Based on STM data and Monte Carlo simulations, we conclude that the CVD-growth morphology is affected by preferential dissociation of Fe(CO){sub 5} molecules at existing Fe clusters -- an autocatalytic effect. We ... continued below

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15 p.

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Mayer, T.M.; Adams, D.P.; Swartzentruber, B.S. & Chason, E. November 1, 1995.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

We study the evolution of layer morphology during the early stages of metal chemical vapor deposition (CVD) onto Si(100) via pyrolysis of Fe(CO){sub 5} below 250{degrees}C. Scanning tunneling microscopy (STM) shows that nuclei formation is limited by precursor dissociation which occurs on terraces, not at step sites. Also, the average size of clusters formed during CVD is larger than for Fe growth by evaporation (a random deposition process). Based on STM data and Monte Carlo simulations, we conclude that the CVD-growth morphology is affected by preferential dissociation of Fe(CO){sub 5} molecules at existing Fe clusters -- an autocatalytic effect. We demonstrate that nucleation kinetics can be used to control formation of metal nanostructures on chemically tailored surfaces. Reactive sites on Si (001) are first passivated by hydrogen. H atoms are locally removed by electron stimulated desorption using electrons emitted from the STM tip. Subsequent pyrolysis of Fe(CO){sub 5} leads to selective nucleation and growth of Fe films in the areas where H has been removed.

Physical Description

15 p.

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OSTI as DE96003544

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  • Other Information: PBD: Nov 1995

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  • Other: DE96003544
  • Report No.: SAND--95-2471
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/170570 | External Link
  • Office of Scientific & Technical Information Report Number: 170570
  • Archival Resource Key: ark:/67531/metadc626307

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  • November 1, 1995

Added to The UNT Digital Library

  • June 16, 2015, 7:43 a.m.

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  • April 14, 2016, 3:35 p.m.

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Mayer, T.M.; Adams, D.P.; Swartzentruber, B.S. & Chason, E. Dynamics of nucleation in chemical vapor deposition, report, November 1, 1995; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc626307/: accessed November 24, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.