Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool

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Description

A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

Physical Description

13 p.

Creation Information

Wronosky, J.B.; Smith, T.G. & Darnold, J.R. December 1, 1995.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 11 times . More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

Physical Description

13 p.

Notes

OSTI as DE96002701

Source

  • 3. international symposium on magnetic suspension technology, Tallahassee, FL (United States), 13-15 Dec 1995

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Identifier

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  • Other: DE96002701
  • Report No.: SAND--95-1243C
  • Report No.: CONF-951214--1
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 135050
  • Archival Resource Key: ark:/67531/metadc624932

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Office of Scientific & Technical Information Technical Reports

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Creation Date

  • December 1, 1995

Added to The UNT Digital Library

  • June 16, 2015, 7:43 a.m.

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  • April 13, 2016, 1:31 p.m.

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Wronosky, J.B.; Smith, T.G. & Darnold, J.R. Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool, article, December 1, 1995; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc624932/: accessed September 22, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.