A single-frequency ECR ion source with a large uniformly distributed resonant plasma volume

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Description

An innovative technique for increasing ion source intensity is described which, in principle, could lead to significant advances in ECR ion source technology for multiply charged ion beam formation. The advanced concept design uses a minimum-B magnetic mirror geometry which consists of a multi-cusp, magnetic field, to assist in confining the plasma radially, a flat central field for tuning to the ECR resonant condition, and specially tailored mirror fields in the end zones to confine the plasma in the axial direction. The magnetic field is designed to achieve an axially symmetric plasma {open_quotes}volume{close_quotes} with constant mod-B, which extends over the ... continued below

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6 p.

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Alton, G.D. & Smithe, D.N. December 1, 1995.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 17 times . More information about this article can be viewed below.

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  • Alton, G.D. Oak Ridge National Lab., TN (United States)
  • Smithe, D.N. Mission Research Corporation, Newington, VA (United States)

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Description

An innovative technique for increasing ion source intensity is described which, in principle, could lead to significant advances in ECR ion source technology for multiply charged ion beam formation. The advanced concept design uses a minimum-B magnetic mirror geometry which consists of a multi-cusp, magnetic field, to assist in confining the plasma radially, a flat central field for tuning to the ECR resonant condition, and specially tailored mirror fields in the end zones to confine the plasma in the axial direction. The magnetic field is designed to achieve an axially symmetric plasma {open_quotes}volume{close_quotes} with constant mod-B, which extends over the length of the central field region. This design, which strongly contrasts with the ECR {open_quotes}surfaces{close_quotes} characteristic of conventional ECR ion sources, results in dramatic increases in the absorption of RF power, thereby increasing the electron temperature and {open_quotes}hot{close_quotes} electron population within the ionization volume of the source.

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6 p.

Notes

INIS; OSTI as DE96003050

Source

  • 12. international workshop on ECR ion sources, Riken (Japan), 25-27 Apr 1995

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  • Other: DE96003050
  • Report No.: CONF-9504165--4
  • Grant Number: AC05-84OR21400
  • Office of Scientific & Technical Information Report Number: 155662
  • Archival Resource Key: ark:/67531/metadc623903

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • December 1, 1995

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  • June 16, 2015, 7:43 a.m.

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  • Jan. 25, 2016, 4:26 p.m.

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Alton, G.D. & Smithe, D.N. A single-frequency ECR ion source with a large uniformly distributed resonant plasma volume, article, December 1, 1995; Tennessee. (digital.library.unt.edu/ark:/67531/metadc623903/: accessed July 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.