Hyperthermal Pulsed-Laser Ablation Beams for Film Deposition and Surface Microstructural Engineering

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This paper presents an overview of pulsed-laser ablation for film deposition and surface microstructure formation. By changing the ambient gas pressure from high vacuum to several Torr (several hundred Pa) and by selecting the pulsed-laser wavelength, the kinetic energy of ablated atoms/ions can be varied from several hundred eV down to {approximately}0.1 eV and films ranging from superhard to nanocrystalline may be deposited. Furthermore, cumulative (multi-pulse) irradiation of a semiconductor surface (e.g. silicon) in an oxidizing gas (0{sub 2}, SF{sub 6}) et atmospheric pressure can produce dense, self-organized arrays of high-aspect-ratio microcolumns or microcones. Thus, a wide range of materials ... continued below

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6 pages

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Lowndes, D.H. November 8, 1999.

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Description

This paper presents an overview of pulsed-laser ablation for film deposition and surface microstructure formation. By changing the ambient gas pressure from high vacuum to several Torr (several hundred Pa) and by selecting the pulsed-laser wavelength, the kinetic energy of ablated atoms/ions can be varied from several hundred eV down to {approximately}0.1 eV and films ranging from superhard to nanocrystalline may be deposited. Furthermore, cumulative (multi-pulse) irradiation of a semiconductor surface (e.g. silicon) in an oxidizing gas (0{sub 2}, SF{sub 6}) et atmospheric pressure can produce dense, self-organized arrays of high-aspect-ratio microcolumns or microcones. Thus, a wide range of materials synthesis and processing opportunities result from the hyperthermal flux and reactive growth conditions provided by pulsed-laser ablation.

Physical Description

6 pages

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OSTI as DE00011465

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  • 3rd Symp. on Advanced Photon and Measurement Technologies, Japan, 11/08/1999

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  • Report No.: ORNL/CP-104571
  • Report No.: KC 02 02 02 0
  • Grant Number: AC05-96OR22464
  • Office of Scientific & Technical Information Report Number: 11465
  • Archival Resource Key: ark:/67531/metadc623353

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  • November 8, 1999

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  • June 16, 2015, 7:43 a.m.

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  • Jan. 19, 2016, 3:40 p.m.

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Lowndes, D.H. Hyperthermal Pulsed-Laser Ablation Beams for Film Deposition and Surface Microstructural Engineering, article, November 8, 1999; Tennessee. (digital.library.unt.edu/ark:/67531/metadc623353/: accessed November 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.