Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement

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Description

An electron injection scheme for controlling transport in a tokamak plasma. Electrons with predominantly perpendicular energy are injected into a ripple field region created by a group of localized poloidal field bending magnets. The trapped electrons then grad-B drift vertically toward the plasma interior until they are detrapped, charging the plasma negative. Calculations indicate that the highly perpendicular velocity electrons can remain stable against kinetic instabilities in the regime of interest for tokamak experiments. The penetration distance can be controlled by controlling the ``ripple mirror ratio``, the energy of the injected electrons, and their v{sub {perpendicular}}/v{sub {parallel}}, ratio. In this ... continued below

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19 p.

Creation Information

Ono, M. & Furth, H. December 1991.

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This patent is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 38 times , with 6 in the last month . More information about this patent can be viewed below.

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Description

An electron injection scheme for controlling transport in a tokamak plasma. Electrons with predominantly perpendicular energy are injected into a ripple field region created by a group of localized poloidal field bending magnets. The trapped electrons then grad-B drift vertically toward the plasma interior until they are detrapped, charging the plasma negative. Calculations indicate that the highly perpendicular velocity electrons can remain stable against kinetic instabilities in the regime of interest for tokamak experiments. The penetration distance can be controlled by controlling the ``ripple mirror ratio``, the energy of the injected electrons, and their v{sub {perpendicular}}/v{sub {parallel}}, ratio. In this scheme, the poloidal torque due to the injected radial current is taken by the magnets and not by the plasma. Injection is accomplished by the flat cathode containing an ECH cavity to pump electrons to high v{sub {perpendicular}}.

Physical Description

19 p.

Notes

INIS; OSTI as DE94003035

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  • Other Information: PBD: 1991

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  • Other: DE94003035
  • Report No.: PATENTS-US--A7789519
  • Grant Number: AC02-76CH03073
  • Office of Scientific & Technical Information Report Number: 140166
  • Archival Resource Key: ark:/67531/metadc621912

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • December 1991

Added to The UNT Digital Library

  • June 16, 2015, 7:43 a.m.

Description Last Updated

  • April 15, 2016, 5:33 p.m.

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Ono, M. & Furth, H. Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement, patent, December 1991; Princeton, New Jersey. (digital.library.unt.edu/ark:/67531/metadc621912/: accessed April 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.