In situ spectroscopic ellipsometry as a surface sensitive tool to probe thin film growth.

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Sputtered thin film and multilayer x-ray mirrors are made routinely at the Advanced Photon Source (APS) for the APS users. Precise film growth control and characterization are very critical in fabricating high-quality x-ray mirrors. Film thickness calibrations are carried out using in situ and ex situ spectroscopic ellipsometry, interferometry, and x-ray scattering. To better understand the growth and optical properties of different thin film systems, we have carried out a systematic study of sputtered thin films of Au, Rh, Pg Pd, Cu, and Cr, using in situ ellipsometry. Multiple data sets were obtained in situ for each film material with ... continued below

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28 p.

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Liu, C. February 19, 1999.

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Description

Sputtered thin film and multilayer x-ray mirrors are made routinely at the Advanced Photon Source (APS) for the APS users. Precise film growth control and characterization are very critical in fabricating high-quality x-ray mirrors. Film thickness calibrations are carried out using in situ and ex situ spectroscopic ellipsometry, interferometry, and x-ray scattering. To better understand the growth and optical properties of different thin film systems, we have carried out a systematic study of sputtered thin films of Au, Rh, Pg Pd, Cu, and Cr, using in situ ellipsometry. Multiple data sets were obtained in situ for each film material with incremental thicknesses and were analyzed with their correlation in mind. We found that in situ spectroscopic ellipsometry as a surface-sensitive tool can also be used to probe the growth and morphology of the thin film system. This application of in situ spectroscopic ellipsometry for metal thin film systems will be discussed.

Physical Description

28 p.

Notes

INIS; OSTI as DE00011063

Medium: P; Size: 28 pages

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  • International Conference on Metallurgical Coatings and Thin Films, San Diego, CA (US), 04/12/1999--04/16/1999

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  • Report No.: ANL/XFD/CP-97499
  • Grant Number: W-31109-ENG-38
  • Office of Scientific & Technical Information Report Number: 11063
  • Archival Resource Key: ark:/67531/metadc620974

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Office of Scientific & Technical Information Technical Reports

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  • February 19, 1999

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  • June 16, 2015, 7:43 a.m.

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  • April 10, 2017, 6:57 p.m.

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Liu, C. In situ spectroscopic ellipsometry as a surface sensitive tool to probe thin film growth., article, February 19, 1999; Illinois. (digital.library.unt.edu/ark:/67531/metadc620974/: accessed July 18, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.