Formation of metal oxides by cathodic arc deposition

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Metal oxide thin films are of interest for a number of applications. Cathodic arc deposition, an established, industrially applied technique for formation of nitrides (e.g. TiN), can also be used for metal oxide thin film formation. A cathodic arc plasma source with desired cathode material is operated in an oxygen atmosphere, and metal oxides of various stoichiometric composition can be formed on different substrates. We report here on a series of experiments on metal oxide formation by cathodic arc deposition for different applications. Black copper oxide has been deposited on ALS components to increase the radiative heat transfer between the ... continued below

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20 p.

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Anders, S.; Anders, A.; Rubin, M.; Wang, Z.; Raoux, S.; Kong, F. et al. March 1, 1995.

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Metal oxide thin films are of interest for a number of applications. Cathodic arc deposition, an established, industrially applied technique for formation of nitrides (e.g. TiN), can also be used for metal oxide thin film formation. A cathodic arc plasma source with desired cathode material is operated in an oxygen atmosphere, and metal oxides of various stoichiometric composition can be formed on different substrates. We report here on a series of experiments on metal oxide formation by cathodic arc deposition for different applications. Black copper oxide has been deposited on ALS components to increase the radiative heat transfer between the parts. Various metal oxides such as tungsten oxide, niobium oxide, nickel oxide and vanadium oxide have been deposited on ITO glass to form electrochromic films for window applications. Tantalum oxide films are of interest for replacing polymer electrolytes. Optical waveguide structures can be formed by refractive index variation using oxide multilayers. We have synthesized multilayers of Al{sub 2}O{sub 3}/Y{sub 2}O{sub 3}/AI{sub 2}O{sub 3}/Si as possible basic structures for passive optoelectronic integrated circuits, and Al{sub 2-x}Er{sub x}O{sub 3} thin films with a variable Er concentration which is a potential component layer for the production of active optoelectronic integrated devices such as amplifiers or lasers at a wavelength of 1.53 {mu}m. Aluminum and chromium oxide films have been deposited on a number of substrates to impart improved corrosion resistance at high temperature. Titanium sub-oxides which are electrically conductive and corrosion resistant and stable in a number of aggressive environments have been deposited on various substrates. These sub-oxides are of great interest for use in electrochemical cells.

Physical Description

20 p.

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OSTI as DE96001122

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  • 22. international AVS conference on metallurgical coatings and thin films (ICMCTF-22), San Diego, CA (United States), 24-28 Apr 1995

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  • Other: DE96001122
  • Report No.: LBL--36166
  • Report No.: CONF-950454--9
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 114037
  • Archival Resource Key: ark:/67531/metadc620409

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  • March 1, 1995

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  • June 16, 2015, 7:43 a.m.

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  • April 5, 2016, 12:26 p.m.

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Anders, S.; Anders, A.; Rubin, M.; Wang, Z.; Raoux, S.; Kong, F. et al. Formation of metal oxides by cathodic arc deposition, article, March 1, 1995; California. (digital.library.unt.edu/ark:/67531/metadc620409/: accessed November 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.