Photon statistics, film preparation and characterization in fluorescent microthermal imaging

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Description

Fluorescent microthermal imaging (FMI) involves coating a sample surface with a thin inorganic-based film that, upon exposure to uv light, emits temperature-dependent fluorescence. FMI offers the ability to create thermal maps of integrated circuits with a thermal resolution theoretically limited to 1 m{degree}C and a spatial resolution diffraction-limited to 0.3 {mu}m. Even though FMI has been in use for more than a decade, many factors that can affect the thermal image quality have not been studied well. This paper presents recent results showing the limitations from photon shot noise and the improvement in signal-to-noise ratio from signal averaging. Three important ... continued below

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6 p.

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Tangyunyong, Paiboon & Barton, D.L. August 1, 1995.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Fluorescent microthermal imaging (FMI) involves coating a sample surface with a thin inorganic-based film that, upon exposure to uv light, emits temperature-dependent fluorescence. FMI offers the ability to create thermal maps of integrated circuits with a thermal resolution theoretically limited to 1 m{degree}C and a spatial resolution diffraction-limited to 0.3 {mu}m. Even though FMI has been in use for more than a decade, many factors that can affect the thermal image quality have not been studied well. This paper presents recent results showing the limitations from photon shot noise and the improvement in signal-to-noise ratio from signal averaging. Three important factors in film preparation and characterization are presented that have a significant impact on thermal quality and sensitivity of FMI: uv bleaching, film dilution, and film curing. It is shown how proper film preparation and data collection method can dramatically improve the quality of FMI thermal images.

Physical Description

6 p.

Notes

OSTI as DE95016098

Source

  • ISTFA `95: 21. international symposium for testing and failure analysis, Santa Clara, CA (United States), 5-10 Nov 1995

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  • Other: DE95016098
  • Report No.: SAND--95-1670C
  • Report No.: CONF-951156--2
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 100055
  • Archival Resource Key: ark:/67531/metadc619876

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  • August 1, 1995

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  • June 16, 2015, 7:43 a.m.

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  • April 14, 2016, 6:33 p.m.

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Tangyunyong, Paiboon & Barton, D.L. Photon statistics, film preparation and characterization in fluorescent microthermal imaging, article, August 1, 1995; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc619876/: accessed September 23, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.