Specialized wavefront sensors for adaptive optics

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The performance of an adaptive optical system is strongly dependent upon correctly measuring the wavefront of the arriving light. The most common wavefront measurement techniques used to date are the shearing interferometer and the Shack-Hartmann sensor. Shack-Hartmann sensors rely on the use of lenslet arrays to sample the aperture appropriately. These have traditionally been constructed using ULM or step and repeat technology, and more recently with binary optics technology. Diffractive optics fabrication methodology can be used to remove some of the limitations of the previous technologies and can allow for low-cost production of sophisticated elements. We have investigated several different ... continued below

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10 p.

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Neal, D.R.; Mansell, J.D. & Gruetzner, J.K. August 1, 1995.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

The performance of an adaptive optical system is strongly dependent upon correctly measuring the wavefront of the arriving light. The most common wavefront measurement techniques used to date are the shearing interferometer and the Shack-Hartmann sensor. Shack-Hartmann sensors rely on the use of lenslet arrays to sample the aperture appropriately. These have traditionally been constructed using ULM or step and repeat technology, and more recently with binary optics technology. Diffractive optics fabrication methodology can be used to remove some of the limitations of the previous technologies and can allow for low-cost production of sophisticated elements. We have investigated several different specialized wavefront sensor configurations using both Shack-Hartmann and shearing interferometer principles. We have taken advantage of the arbitrary nature of these elements to match pupil shapes of detector and telescope aperture and to introduce magnification between the lenslet array and the detector. We have fabricated elements that facilitate matching the sampling to the current atmospheric conditions. The sensors were designed using a far-field diffraction model and a photolithography layout program. They were fabricated using photolithography and RIE etching. Several different designs will be presented with some experimental results from a small-scale adaptive optics brass-board.

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10 p.

Notes

OSTI as DE95016413

Source

  • 40. annual meeting of the Society of Photo-Optical Instrumentation Engineers, San Diego, CA (United States), 9-14 Jul 1995

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  • Other: DE95016413
  • Report No.: SAND--94-3229C
  • Report No.: CONF-950793--14
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 100308
  • Archival Resource Key: ark:/67531/metadc619227

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • August 1, 1995

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  • June 16, 2015, 7:43 a.m.

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  • April 14, 2016, 7 p.m.

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Neal, D.R.; Mansell, J.D. & Gruetzner, J.K. Specialized wavefront sensors for adaptive optics, article, August 1, 1995; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc619227/: accessed October 23, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.