Effect of Silyation on Organosilcate Glass Films

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Photoresist stripping with oxygen plasma ashing destroys the functional groups in organosilicate glass films and induce moisture uptake, causing low-k dielectric degradation. In this study, hexamethyldisilazane (HMDS), triethylchlorosilane and tripropylchlorosilane are used to repair the damage to organosilicate glass by the O2 plasma ashing process. The optimization of the surface functionalization of the organosilicate glass by the silanes and the thermal stability of the functionalized surfaces are investigated. These experimental results show that HMDS is a promising technique to repair the damage to OSG during the photoresist removal processing and that the heat treatment of the functionalized surfaces causes degradation ... continued below

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Kadam, Poonam August 2004.

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  • Kadam, Poonam

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Description

Photoresist stripping with oxygen plasma ashing destroys the functional groups in organosilicate glass films and induce moisture uptake, causing low-k dielectric degradation. In this study, hexamethyldisilazane (HMDS), triethylchlorosilane and tripropylchlorosilane are used to repair the damage to organosilicate glass by the O2 plasma ashing process. The optimization of the surface functionalization of the organosilicate glass by the silanes and the thermal stability of the functionalized surfaces are investigated. These experimental results show that HMDS is a promising technique to repair the damage to OSG during the photoresist removal processing and that the heat treatment of the functionalized surfaces causes degradation of the silanes deteriorating the hydrophobicity of the films.

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UNT Student Graduate Works

This collection houses graduate student works other than theses and dissertations. All materials have been previously accepted by a professional organization or approved by a faculty mentor. The collection includes, but is not limited to problems in lieu of thesis, supplemental files associated with theses and dissertations, posters, recitals, presentations, articles, reviews, book chapters, and artwork. Some items in this collection are restricted to use by the UNT community.

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  • August 2004

Added to The UNT Digital Library

  • Feb. 15, 2008, 3:38 p.m.

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  • March 21, 2016, 4:15 p.m.

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Citations, Rights, Re-Use

Kadam, Poonam. Effect of Silyation on Organosilcate Glass Films, thesis, August 2004; Denton, Texas. (digital.library.unt.edu/ark:/67531/metadc4549/: accessed October 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; .