Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate Metadata

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Title

  • Main Title Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate

Creator

  • Author: Huang, Long
    Creator Type: Personal

Contributor

  • Chair: Chyan, Oliver M. R.
    Contributor Type: Personal
    Contributor Info: Major Professor
  • Committee Member: Golden, Teresa D.
    Contributor Type: Personal

Publisher

  • Name: University of North Texas
    Place of Publication: Denton, Texas

Date

  • Creation: 2003-12
  • Digitized: 2003-11-27

Language

  • English

Description

  • Content Description: The aim of this thesis was to investigate the physical and electrochemical properties of sub monolayer and monolayer of copper deposition on the polycrystalline iridium, ruthenium and its conductive oxide. The electrochemical methods cyclic voltammetry (CV) and chronocoulometry were used to study the under potential deposition. The electrochemical methods to oxidize the ruthenium metal are presented, and the electrochemical properties of the oxide ruthenium are studied. The full range of CV is presented in this thesis, and the distances between the stripping bulk peak and stripping UPD peak in various concentration of CuSO4 on iridium, ruthenium and its conductive oxide are shown, which yields thermodynamic data on relative difference of bonding strength between Cu-Ru/Ir atoms and Cu-Cu atoms. The monolayer of UPD on ruthenium is about 0.5mL, and on oxidized ruthenium is around 0.9mL to 1.0mL. The conductive oxide ruthenium presents the similar properties of ruthenium metal. The pH effect of stripping bulk peak and stripping UPD peak of copper deposition on ruthenium and oxide ruthenium was investigated. The stripping UPD peak and stripping bulk peak disappeared after the pH ≥ 3 on oxidized ruthenium electrode, and a new peak appeared, which means the condition of pH is very important. The results show that the Cl- , SO42- , Br- will affect the position of stripping bulk peak and stripping UPD peak: the stripping bulk peak will shift and decrease if the concentration of halide ions is increasing, and the monolayer of UPD will increase at the same time.

Subject

  • Library of Congress Subject Headings: Copper.
  • Library of Congress Subject Headings: Electrochemistry.
  • Library of Congress Subject Headings: Iridium.
  • Library of Congress Subject Headings: Ruthenium.
  • Keyword: Cyclic voltammetry
  • Keyword: chronocoulometry
  • Keyword: copper deposition

Collection

  • Name: UNT Theses and Dissertations
    Code: UNTETD

Institution

  • Name: UNT Libraries
    Code: UNT

Rights

  • Rights Access: public
  • Rights License: copyright
  • Rights Holder: Huang, Long
  • Rights Statement: Copyright is held by the author, unless otherwise noted. All rights reserved.

Resource Type

  • Thesis or Dissertation

Format

  • Text

Identifier

  • OCLC: 54479817
  • Archival Resource Key: ark:/67531/metadc4416

Degree

  • Degree Name: Master of Science
  • Degree Level: Master's
  • Degree Discipline: Analytical Chemistry
  • Academic Department: Department of Chemistry
  • Degree Grantor: University of North Texas

Note