Film for Use in Microelectronic Devices and Methods of Producing Same

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Description

Patent relating to film for use in microelectronic devices and methods of producing same.

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11 p. : ill.

Creation Information

Kelber, Jeffry A. October 23, 2001.

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This patent is part of the collection entitled: UNT Scholarly Works and was provided by UNT College of Arts and Sciences to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 63 times . More information about this patent can be viewed below.

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Description

Patent relating to film for use in microelectronic devices and methods of producing same.

Physical Description

11 p. : ill.

Notes

Abstract: The present invention provides thin films for use in microelectronic devices. In one aspect, the present invention provides a copper diffusion barrier. In another aspect, the present invention provides a polymer film for various applications including use as a dielectric insulator and surface modification layers. Methods for the production of the films are also disclosed.

Related U.S. Application Data: Division of application number 09/058,474, filed on April 10, 1998, now Patent Number 6114032.

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UNT Scholarly Works

Materials from the UNT community's research, creative, and scholarly activities and UNT's Open Access Repository. Access to some items in this collection may be restricted.

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Submitted Date

  • July 27, 2000

Accepted Date

  • October 23, 2001

Creation Date

  • October 23, 2001

Added to The UNT Digital Library

  • July 15, 2014, 5:33 a.m.

Description Last Updated

  • Dec. 12, 2017, 8:19 p.m.

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Citations, Rights, Re-Use

Kelber, Jeffry A. Film for Use in Microelectronic Devices and Methods of Producing Same, patent, October 23, 2001; [Washington, D.C.]. (digital.library.unt.edu/ark:/67531/metadc306810/: accessed December 17, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT College of Arts and Sciences.