This document compiles top-level user specifications for an EUV microscope for characterizing EUVL mask defects. Two broad categories of application are considered: (1) emulation of the imaging characteristics of a stepper for printability analysis (AIM mode); and (2) high-resolution imaging for obtaining a more detailed characterization of defects or mask features. It is generally assumed that the mask defects that are to be characterized have been located by a previous inspection procedure and the spatial coordinates of the defect can be transferred to the microscope.
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Lawrence Livermore National Lab., CA (United States)
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California
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Description
This document compiles top-level user specifications for an EUV microscope for characterizing EUVL mask defects. Two broad categories of application are considered: (1) emulation of the imaging characteristics of a stepper for printability analysis (AIM mode); and (2) high-resolution imaging for obtaining a more detailed characterization of defects or mask features. It is generally assumed that the mask defects that are to be characterized have been located by a previous inspection procedure and the spatial coordinates of the defect can be transferred to the microscope.
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Barty, A. & Taylor, J. S.Top Level User Specifications for Mask Inspection Microscope,
report,
January 31, 2002;
California.
(https://digital.library.unt.edu/ark:/67531/metadc1401778/:
accessed July 8, 2025),
University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu;
crediting UNT Libraries Government Documents Department.
