Development of reflective optical systems for XUV projection lithography

PDF Version Also Available for Download.

Description

We describe two full-field reflective reduction systems (1 cm{sup 2} and 6.25 cm{sup 2} image area) and one scanning system (25 mm x scan length image size) that meet the performance requirements for 0.1-{mu}m resolution projection lithography using extreme-ultraviolet (XUV) wavelengths from 10 to 15 nm. These systems consist of two centered, symmetric, annular aspheric mirrors with 35--40% central obscuration, providing a reduction ratio of 3.3 x. Outstanding features include the remarkably low distortion ({le} 10 nm) over the entire image field and the comparatively liberal tolerances on the mirror radii and alignment. While optimized annular illumination can improve the ... continued below

Physical Description

Pages: (5 p)

Creation Information

Viswanathan, V.K. & Newnam, B.E. January 1, 1991.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

Who

People and organizations associated with either the creation of this article or its content.

Sponsor

Publisher

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this article. Follow the links below to find similar items on the Digital Library.

Description

We describe two full-field reflective reduction systems (1 cm{sup 2} and 6.25 cm{sup 2} image area) and one scanning system (25 mm x scan length image size) that meet the performance requirements for 0.1-{mu}m resolution projection lithography using extreme-ultraviolet (XUV) wavelengths from 10 to 15 nm. These systems consist of two centered, symmetric, annular aspheric mirrors with 35--40% central obscuration, providing a reduction ratio of 3.3 x. Outstanding features include the remarkably low distortion ({le} 10 nm) over the entire image field and the comparatively liberal tolerances on the mirror radii and alignment. While optimized annular illumination can improve the performance, the required performance can be met with full illumination, thereby allowing a simpler system design. 6 refs., 3 figs., 3 tabs.

Physical Description

Pages: (5 p)

Notes

OSTI; NTIS; GPO Dep.

Source

  • Soft-x-ray projection lithography topical meeting, Monterey, CA (USA), 10-12 Apr 1991

Language

Item Type

Identifier

Unique identifying numbers for this article in the Digital Library or other systems.

  • Other: DE91013167
  • Report No.: LA-UR-91-1439
  • Report No.: CONF-9104203--3
  • Grant Number: W-7405-ENG-36
  • Office of Scientific & Technical Information Report Number: 5774268
  • Archival Resource Key: ark:/67531/metadc1095808

Collections

This article is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

What responsibilities do I have when using this article?

When

Dates and time periods associated with this article.

Creation Date

  • January 1, 1991

Added to The UNT Digital Library

  • Feb. 18, 2018, 3:59 p.m.

Description Last Updated

  • May 30, 2018, 4:16 p.m.

Usage Statistics

When was this article last used?

Yesterday: 0
Past 30 days: 2
Total Uses: 6

Interact With This Article

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

International Image Interoperability Framework

IIF Logo

We support the IIIF Presentation API

Viswanathan, V.K. & Newnam, B.E. Development of reflective optical systems for XUV projection lithography, article, January 1, 1991; New Mexico. (digital.library.unt.edu/ark:/67531/metadc1095808/: accessed October 22, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.