Amorphous thin films for solar cell application. Quarterly report No. 1, March 31-June 30, 1979

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The prospects for generation of significant electric power using low-cost photovoltaic solar cells seem brighter with recent developments in sensitive impurity doping of glow-discharge-produced films of amorphous silicon containing large amounts of hydrogen (a-Si:H). The approach being taken to achieve the program objective centers on substituting sputtering for glow-discharge in the deposition of the a-Si:H films. Both planar and cylindrical forms of magnetron sputtering are being investigated in this program. Brief descriptions of the systems being used are presented. The planar system has the advantage that experimental costs are low; the cylindrical system is easily scalable to large product throughput. ... continued below

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Pages: 33

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Jonath, A D; MacMillan, H F; Crowley, J L; Anderson, W W; Junga, F A; Kooi, C F et al. July 1, 1979.

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Description

The prospects for generation of significant electric power using low-cost photovoltaic solar cells seem brighter with recent developments in sensitive impurity doping of glow-discharge-produced films of amorphous silicon containing large amounts of hydrogen (a-Si:H). The approach being taken to achieve the program objective centers on substituting sputtering for glow-discharge in the deposition of the a-Si:H films. Both planar and cylindrical forms of magnetron sputtering are being investigated in this program. Brief descriptions of the systems being used are presented. The planar system has the advantage that experimental costs are low; the cylindrical system is easily scalable to large product throughput. A-Si:H films are being prepared by magnetron sputtering, with reactive gases and/or doped Si targets, to achieve a reproducible and controllable process for the fabrication of solar cell devices. Ion implantation is being used for alloying and doping studies. This allows for a rapid and systematic survey of alloy materials, such as H, F and transition metals, for reducing mid-gap states, and also dopants, such as B, P and As, for conductivity control. In addition to being a flexible exploratory tool, ion implantation also has the potential for incorporation into large-scale production processes. The first quarter program plan emphasis was on film deposition, ion implantation and characterization. Progress is rported. (WHK)

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Pages: 33

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Dep. NTIS, PC A03/MF A01.

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  • Report No.: DOE/ET/23040-1
  • Grant Number: AC03-79ET23040
  • DOI: 10.2172/5601013 | External Link
  • Office of Scientific & Technical Information Report Number: 5601013
  • Archival Resource Key: ark:/67531/metadc1093665

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  • July 1, 1979

Added to The UNT Digital Library

  • Feb. 10, 2018, 10:06 p.m.

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  • April 16, 2018, 6:34 p.m.

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Jonath, A D; MacMillan, H F; Crowley, J L; Anderson, W W; Junga, F A; Kooi, C F et al. Amorphous thin films for solar cell application. Quarterly report No. 1, March 31-June 30, 1979, report, July 1, 1979; United States. (digital.library.unt.edu/ark:/67531/metadc1093665/: accessed September 25, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.