Electrical characterization of rf plasmas

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Radio-frequency (rf) electrical sources are commonly used to generate plasmas for processing of industrial materials and for related experimental work. Published descriptions of such plasmas usually include generator-power measurements, and occasionally include plasma dc-bias measurements. One or both of these quantitites are also used in industrial feedback ccontrol systems for setpoint regulation. Recent work at Sandia an elsewhere with an experimental rf discharge device (the GEC RF Reference Cell'') has shown that power and dc-bias levels are often insufficient information for specifying the state of the plasma. The plasma can have nonlinear electrical characteristics that cause harmonic generation, and the ... continued below

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Pages: (9 p)

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Miller, P.A. August 1, 1991.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Radio-frequency (rf) electrical sources are commonly used to generate plasmas for processing of industrial materials and for related experimental work. Published descriptions of such plasmas usually include generator-power measurements, and occasionally include plasma dc-bias measurements. One or both of these quantitites are also used in industrial feedback ccontrol systems for setpoint regulation. Recent work at Sandia an elsewhere with an experimental rf discharge device (the GEC RF Reference Cell'') has shown that power and dc-bias levels are often insufficient information for specifying the state of the plasma. The plasma can have nonlinear electrical characteristics that cause harmonic generation, and the harmonic levels can depend sensitively on the impedance of the external circuitry at harmonic frequencies. Even though the harmonics may be low in amplitude, they can be directly related to large changes in plasma power and to changes in optical emission from the plasma. Consequently, in order for a worker to truly master the plasma-generation process, it is necessary to understand, measure, and control electrical characteristics of the plamsa. In this paper we describe technique that have been developed from work with the Reference Cell for making electrical measurements on rf plasmas, and we describe surprising observations of harmonic behavior. 10 refs., 4 figs.

Physical Description

Pages: (9 p)

Notes

OSTI; NTIS; GPO Dep.

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  • SPIE meeting on advanced techniques for integrated circuit processing, San Jose, CA (United States), Oct 1991

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  • Other: DE92000822
  • Report No.: SAND-91-1824C
  • Report No.: CONF-9110234--1
  • Grant Number: AC04-76DP00789
  • Office of Scientific & Technical Information Report Number: 5289145
  • Archival Resource Key: ark:/67531/metadc1071608

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • August 1, 1991

Added to The UNT Digital Library

  • Feb. 4, 2018, 10:51 a.m.

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  • May 16, 2018, 1:37 p.m.

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Miller, P.A. Electrical characterization of rf plasmas, article, August 1, 1991; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc1071608/: accessed November 17, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.