Discharge circuits and loads Page: 57 of 62
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DISCHARGE CIRCUITS AND LOADS
FIGURE 28: CARBON DIOXIDE LASER LOADS
Electron beam controlled discharge
- pure resistive load compared to diode magnetron type of load
- can use type C PFN in Marx stages
- large units: Z 3 i for 2.5 us discharge times
N ll" i.
0V [, IU U
Fio. t. eCO.V, ! Sfl typeC Oulflenn-Mara netwgre. Thc is the
Wual creunt ilnorin stray inductance, Circui element valuq, te
discused iN the ait. A "sa" is considered to be a sprk gap, a
set dr posftlvely chsrsed capcuorn. tnd a set dr negauvely charued
1 mesh LC
he P'N uwek.
PER STAGE: TYPE C PFN
L1 0.63 C1 Zo2
L2 6.5 C2 Zo2
C2 * 0.042
Defining T, Vpk and U stored
defines all the particular
then C1 8.6 F
C2 0.58 F For
L 220 F Zo * 2.5 .
L- 235 F
Advantages for Resistive Load:
1. V per stage times n ' VL
2. Stray L in connection loop
affects risetime hut not
3. Waveform readily changed.
. Can use with time vary-
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Sarjeant, W.J. Discharge circuits and loads, report, October 15, 1980; New Mexico. (https://digital.library.unt.edu/ark:/67531/metadc1061299/m1/57/: accessed April 23, 2019), University of North Texas Libraries, Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.