Chemical vapor deposition of thoriated tungsten protective cups Page: 13 of 45
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LIST OF ILLUSTRATIONS
1 Dimensional Requirements of Thoriated Tungsten Protective Cups 2-1
2 Non-Uniform Structure of Powdered Thoria Entrainment in
Gas Stream 100X 3-2
3 Structure of Co-Deposited Thoria in Tungsten from an All-Gaseous
Reactant System 3-4
4 Chemical Vapor Deposition Apparatus Used at San Fernando
5 Typical Recrystallized Fine, Equiaxed Grain Structure 500X 3-6
6 Mandrel for CVD Cups, per MESK 00315 3-8
7 As-Deposited with Mandrel Removed by Chemical Etching 3-9
8 As-Deposited Grain Structure 100X 3-9
9 Super-Fine, Equiaxed Grain Structure after Stress Relief Heat
Treatment at 20000C 800X 3-10
10 Cup Finished to MESK-00316 3-11
11 Modules on As-Deposited Part 4-3
12 20000C Heat Treated CVD Thoriated Tungsten on Pure
PM Tungsten Mandrel 4-3
13 Porosity in 2200oC Stress Relieved Thoriated Tungsten 4-4
14 Strength of CVD Tungsten and Thoriated Tungsten at Elevated
15 Columnar Type Structure Produced with a Gas Flow Velocity
of 2200 cm/min 100X 5-1
16 Microstructure Resulting from Gas Flow Plating Velocities
Varying from 2300-2550 cm/min 5-2
17 Equiaxed Structure Resulting from Gas Flow Velocity
of 2650 cm/min 500X 5-3
18 NRX-A6 CVD Thoriated Tungsten Back-to-Back Protective Cup 6-1
19 R-1 CVD Thoriated Tungsten Cup 6-2
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Blay, J.S. Chemical vapor deposition of thoriated tungsten protective cups, report, January 1, 1968; Pittsburgh, Pennsylvania. (https://digital.library.unt.edu/ark:/67531/metadc1026564/m1/13/: accessed March 24, 2019), University of North Texas Libraries, Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.