Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time

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In this paper, the corner rounding bias of a commercially available extreme ultraviolet photoresist is monitored as molecular weight, photoacid generator (PAG) size, and development time are varied. These experiments show that PAG size influences corner biasing while molecular weight and development time do not. Large PAGs are shown to exhibit less corner biasing, and in some cases, lower corner rounding, than small PAGs. In addition, heavier resist polymers are shown to exhibit less corner rounding than lighter ones.

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Anderson, Christopher; Daggett, Joe & Naulleau, Patrick December 31, 2009.

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In this paper, the corner rounding bias of a commercially available extreme ultraviolet photoresist is monitored as molecular weight, photoacid generator (PAG) size, and development time are varied. These experiments show that PAG size influences corner biasing while molecular weight and development time do not. Large PAGs are shown to exhibit less corner biasing, and in some cases, lower corner rounding, than small PAGs. In addition, heavier resist polymers are shown to exhibit less corner rounding than lighter ones.

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  • SPIE Advanced Lithography, San Jose, CA, February 22-25, 2010

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  • Report No.: LBNL-3147E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 982925
  • Archival Resource Key: ark:/67531/metadc1015633

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  • December 31, 2009

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  • Oct. 14, 2017, 8:36 a.m.

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  • Oct. 17, 2017, 8:07 p.m.

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Anderson, Christopher; Daggett, Joe & Naulleau, Patrick. Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time, article, December 31, 2009; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc1015633/: accessed October 19, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.