ULTRA-LOW-ENERGY HIGH-CURRENT ION SOURCE

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The technical objective of the project was to develop an ultra-low-energy, high-intensity ion source (ULEHIIS) for materials processing in high-technology fields including semiconductors, micro-magnetics and optics/opto-electronics. In its primary application, this ion source can be incorporated into the 4Wave thin-film deposition technique called biased target ion-beam deposition (BTIBD), which is a deposition technique based on sputtering (without magnetic field, i.e., not the typical magnetron sputtering). It is a technological challenge because the laws of space charge limited current (Child-Langmuir) set strict limits of how much current can be extracted from a reservoir of ions, such as a suitable discharge plasma. ... continued below

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Anders, Andre; Yushkov, Georgy Yu. & Baldwin, David A. November 20, 2009.

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Description

The technical objective of the project was to develop an ultra-low-energy, high-intensity ion source (ULEHIIS) for materials processing in high-technology fields including semiconductors, micro-magnetics and optics/opto-electronics. In its primary application, this ion source can be incorporated into the 4Wave thin-film deposition technique called biased target ion-beam deposition (BTIBD), which is a deposition technique based on sputtering (without magnetic field, i.e., not the typical magnetron sputtering). It is a technological challenge because the laws of space charge limited current (Child-Langmuir) set strict limits of how much current can be extracted from a reservoir of ions, such as a suitable discharge plasma. The solution to the problem was an innovative dual-discharge system without the use of extraction grids.

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  • Report No.: LBNL-3026E
  • Grant Number: DE-AC02-05CH11231
  • DOI: 10.2172/981525 | External Link
  • Office of Scientific & Technical Information Report Number: 981525
  • Archival Resource Key: ark:/67531/metadc1014205

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Office of Scientific & Technical Information Technical Reports

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Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • November 20, 2009

Added to The UNT Digital Library

  • Oct. 14, 2017, 8:36 a.m.

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  • Nov. 7, 2017, 7:17 p.m.

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Anders, Andre; Yushkov, Georgy Yu. & Baldwin, David A. ULTRA-LOW-ENERGY HIGH-CURRENT ION SOURCE, report, November 20, 2009; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc1014205/: accessed July 22, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.