EUV mask surface cleaning effects on lithography process performance

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The reflective, multilayer based, mask architectures for extreme ultraviolet (EUV) lithography are highly susceptible to surface oxidation and contamination. As a result, EUV masks are expected to undergo cleaning processes in order to maintain the lifetimes necessary for high volume manufacturing. For this study, the impact of repetitive cleaning of EUV masks on imaging performance was evaluated. Two, high quality industry standard, EUV masks are used for this study with one of the masks undergoing repeated cleaning and the other one kept as a reference. Lithographic performance, in terms of process window analysis and line edge roughness, was monitored after ... continued below

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George, Simi; Baclea-an, Lorie Mae; Naulleau, Patrick; Chen, Robert J. & Liang, Ted June 18, 2010.

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The reflective, multilayer based, mask architectures for extreme ultraviolet (EUV) lithography are highly susceptible to surface oxidation and contamination. As a result, EUV masks are expected to undergo cleaning processes in order to maintain the lifetimes necessary for high volume manufacturing. For this study, the impact of repetitive cleaning of EUV masks on imaging performance was evaluated. Two, high quality industry standard, EUV masks are used for this study with one of the masks undergoing repeated cleaning and the other one kept as a reference. Lithographic performance, in terms of process window analysis and line edge roughness, was monitored after every two cleans and compared to the reference mask performance. After 8x clean, minimal degradation is observed. The cleaning cycles will be continued until significant loss imaging fidelity is found.

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  • Journal Name: Journal of Vacuum Science and Technology B

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  • Report No.: LBNL-3824E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 989848
  • Archival Resource Key: ark:/67531/metadc1013997

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • June 18, 2010

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  • Oct. 14, 2017, 8:36 a.m.

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  • Oct. 17, 2017, 8:14 p.m.

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George, Simi; Baclea-an, Lorie Mae; Naulleau, Patrick; Chen, Robert J. & Liang, Ted. EUV mask surface cleaning effects on lithography process performance, article, June 18, 2010; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc1013997/: accessed November 18, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.