Mask roughness induced LER: a rule of thumb -- paper Metadata

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  • Main Title Mask roughness induced LER: a rule of thumb -- paper


  • Author: McClinton, Brittany
    Creator Type: Personal
  • Author: Naulleau, Patrick
    Creator Type: Personal


  • Sponsor: Materials Sciences Division
    Contributor Type: Organization


  • Name: Lawrence Berkeley National Laboratory
    Place of Publication: Berkeley, California
    Additional Info: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (United States)


  • Creation: 2010-03-12


  • English


  • Content Description: Much work has already been done on how both the resist and line-edge roughness (LER) on the mask affect the final printed LER. What is poorly understood, however, is the extent to which system-level effects such as mask surface roughness, illumination conditions, and defocus couple to speckle at the image plane, and currently factor into LER limits. Here, we propose a 'rule-of-thumb' simplified solution that provides a fast and powerful method to obtain mask roughness induced LER. We present modeling data on an older generation mask with a roughness of 230 pm as well as the ultimate target roughness of 50 pm. Moreover, we consider feature sizes of 50 nm and 22 nm, and show that as a function of correlation length, the LER peaks at the condition that the correlation length is approximately equal to the resolution of the imaging optic.
  • Physical Description: 9


  • Keyword: Roughness
  • STI Subject Categories: 36
  • Keyword: Simulation
  • Keyword: Targets
  • Keyword: Illuminance
  • Keyword: Resolution


  • Conference: SPIE advanced lithography , San Jose, CA, February 22-25, 2010


  • Name: Office of Scientific & Technical Information Technical Reports
    Code: OSTI


  • Name: UNT Libraries Government Documents Department
    Code: UNTGD

Resource Type

  • Article


  • Text


  • Report No.: LBNL-3309E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 983175
  • Archival Resource Key: ark:/67531/metadc1013103