Mask roughness induced LER: a rule of thumb -- paper Metadata

Metadata describes a digital item, providing (if known) such information as creator, publisher, contents, size, relationship to other resources, and more. Metadata may also contain "preservation" components that help us to maintain the integrity of digital files over time.

Title

  • Main Title Mask roughness induced LER: a rule of thumb -- paper

Creator

  • Author: McClinton, Brittany
    Creator Type: Personal
  • Author: Naulleau, Patrick
    Creator Type: Personal

Contributor

  • Sponsor: Materials Sciences Division
    Contributor Type: Organization

Publisher

  • Name: Lawrence Berkeley National Laboratory
    Place of Publication: Berkeley, California
    Additional Info: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (United States)

Date

  • Creation: 2010-03-12

Language

  • English

Description

  • Content Description: Much work has already been done on how both the resist and line-edge roughness (LER) on the mask affect the final printed LER. What is poorly understood, however, is the extent to which system-level effects such as mask surface roughness, illumination conditions, and defocus couple to speckle at the image plane, and currently factor into LER limits. Here, we propose a 'rule-of-thumb' simplified solution that provides a fast and powerful method to obtain mask roughness induced LER. We present modeling data on an older generation mask with a roughness of 230 pm as well as the ultimate target roughness of 50 pm. Moreover, we consider feature sizes of 50 nm and 22 nm, and show that as a function of correlation length, the LER peaks at the condition that the correlation length is approximately equal to the resolution of the imaging optic.
  • Physical Description: 9

Subject

  • Keyword: Roughness
  • STI Subject Categories: 36
  • Keyword: Simulation
  • Keyword: Targets
  • Keyword: Illuminance
  • Keyword: Resolution

Source

  • Conference: SPIE advanced lithography , San Jose, CA, February 22-25, 2010

Collection

  • Name: Office of Scientific & Technical Information Technical Reports
    Code: OSTI

Institution

  • Name: UNT Libraries Government Documents Department
    Code: UNTGD

Resource Type

  • Article

Format

  • Text

Identifier

  • Report No.: LBNL-3309E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 983175
  • Archival Resource Key: ark:/67531/metadc1013103