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Tantalum- and ruthenium-based diffusion barriers/adhesion promoters for copper/silicon dioxide and copper/low κ integration.

Description: The TaSiO6 films, ~8Å thick, were formed by sputter deposition of Ta onto ultrathin SiO2 substrates at 300 K, followed by annealing to 600 K in 2 torr O2. X-ray photoelectron spectroscopy (XPS) measurements of the films yielded a Si(2p) binding energy at 102.1 eV and Ta(4f7/2) binding energy at 26.2 eV, indicative of Ta silicate formation. O(1s) spectra indicate that the film is substantially hydroxylated. Annealing the film to > 900 K in UHV resulted in silicate decomposition to SiO2 and Ta2… more
Date: December 2004
Creator: Zhao, Xiaopeng
Partner: UNT Libraries

Passivation effects of surface iodine layer on tantalum for the electroless copper deposition.

Description: The ability to passivate metallic surfaces under non-UHV conditions is not only of fundamental interests, but also of growing practical importance in catalysis and microelectronics. In this work, the passivation effect of a surface iodine layer on air-exposed Ta for the copper electroless deposition was investigated by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). Although the passivation effect was seriously weakened by the prolonged air exposure, iodine passiv… more
Access: Restricted to the UNT Community Members at a UNT Libraries Location.
Date: May 2004
Creator: Liu, Jian
Partner: UNT Libraries
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Trace Elements Investigations : The Occurrence of Columbium and Tantalum

Description: The following report is the fourth in a series of reports on rare and uncommon elements prepared by the Geological Survey. This report covers columbius and tantalus, two chemical elements belonging to the fifth group of the periodic table and quinquevalent in most of their compounds.
Date: August 8, 1983
Creator: Fleischer, Michael & Harder, James O.
Partner: UNT Libraries Government Documents Department
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Investigation of Tantalum in a 3,800 Degrees Fahrenheit Supersonic Airstream

Description: "An investigation of tantalum was made in still air and in high-velocity air to determine its resistance to oxidation at high temperatures. Experiments show that, except for a narrow range of temperature, unprotected tantalum is not suitable for airframe parts exposed to air at high stagnation temperatures, because above this temperature range tantalum oxidizes or burns rapidly" (p. 1).
Date: January 9, 1958
Creator: Trout, Otto F., Jr. & Modisette, Jerry L.
Partner: UNT Libraries Government Documents Department
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