Search Results

open access

The Effect of Acidity and Reducing Agents on Ruthenium Solvent Extraction by Tributyl Phosphate in the 25 Process

Description: Results of tracer studies suggest that, in tributyl phosphate extraction processes designed to recover and purify fissionable material, minimum ruthenium extraction should be obtained from feeds at least 2 M in nitric acid or at least 1 M acid-deficient. Ruthenium decontamination was decreased by preheating the feed and increased by pretreatment with reducing agents. A pretreatment using 0.06 M ferrous ion and 0.5 M urea with 1 hr simmering at 85°C should increase ruthenium decontamination abou… more
Date: December 15, 1954
Creator: Flanary, J. R. & Frashier, L. D.
Partner: UNT Libraries Government Documents Department
open access

Substitution Chemistry of Ruthenium Clusters with the Diphosphine Ligands: 4,5-Bis(Diphenylphosphino)-4-Cyclo-Penten-1,3-Dione (bpcd), (Z)-Ph₂PCH=CHPP₂ and 3,4-Bis(Diphenylphosphino)-5-Methoxy-2(5H)-Furanone (bmf)

Description: The chemistry of transition metal clusters has been a fast developing area of organometallic research in recent years. Compared to mononuclear metal complexes, polynuclear clusters offer more opportunities to study cooperative effects and electron reservoir properties between contiguous metal centers, in addition to functioning as storehouses for the release of catalytically active small fragments capable of exhibiting heterosite subtrate activation. Theoretically, metal clusters are intermedia… more
Date: May 1997
Creator: Shen, Huafeng
Partner: UNT Libraries
open access

Tantalum- and ruthenium-based diffusion barriers/adhesion promoters for copper/silicon dioxide and copper/low κ integration.

Description: The TaSiO6 films, ~8Å thick, were formed by sputter deposition of Ta onto ultrathin SiO2 substrates at 300 K, followed by annealing to 600 K in 2 torr O2. X-ray photoelectron spectroscopy (XPS) measurements of the films yielded a Si(2p) binding energy at 102.1 eV and Ta(4f7/2) binding energy at 26.2 eV, indicative of Ta silicate formation. O(1s) spectra indicate that the film is substantially hydroxylated. Annealing the film to > 900 K in UHV resulted in silicate decomposition to SiO2 and Ta2… more
Date: December 2004
Creator: Zhao, Xiaopeng
Partner: UNT Libraries
open access

Interfacial Study of Copper Electrodeposition with the Electrochemical Quartz Crystal Microbalance (EQCM)

Description: The electrochemical quartz crystal microbalance (EQCM) has been proven an effective mean of monitoring up to nano-scale mass changes related to electrode potential variations at its surface. The principles of operation are based on the converse piezoelectric response of quartz crystals to mass variations on the crystal surface. In this work, principles and operations of the EQCM and piezo-electrodes are discussed. A conductive oxide, ruthenium oxide (RuO2) is a promising material to be used as … more
Date: May 2005
Creator: Ojeda Mota, Oscar Ulises
Partner: UNT Libraries

Cu Electrodeposition on Ru with a Chemisorbed Iodine Surface Layer.

Description: An iodine surface layer has been prepared on Ru(poly) and Ru(0001) electrodes by exposure to iodine vapor in UHV and polarizing in a 0.1 M HClO4/0.005 M KI solution, respectively. A saturation coverage of I on a Ru(poly) electrode passivates the Ru surface against significant hydroxide, chemisorbed oxygen or oxide formation during exposure to water vapor over an electrochemical cell in a UHV-electrochemistry transfer system. Immersion of I-Ru(poly) results in greater hydroxide and chemisorbed o… more
Access: Restricted to the UNT Community Members at a UNT Libraries Location.
Date: August 2005
Creator: Lei, Jipu
Partner: UNT Libraries
open access

Study of Ruthenium and Ruthenium Oxide's Electrochemical Properties and Application as a Copper Diffusion Barrier

Description: As a very promising material of copper diffusion barrier for next generation microelectronics, Ru has already obtained a considerable attention recently. In this dissertation, we investigated ruthenium and ruthenium oxide electrochemical properties and the application as a copper diffusion barrier. Cu under potential deposition (UPD) on the RuOx formed electrochemically was first observed. Strong binding interaction, manifesting by the observed Cu UPD process, exists between Cu and Ru as well … more
Date: August 2005
Creator: Zhang, Yibin
Partner: UNT Libraries

Materials properties of ruthenium and ruthenium oxides thin films for advanced electronic applications.

Description: Ruthenium and ruthenium dioxide thin films have shown great promise in various applications, such as thick film resistors, buffer layers for yttrium barium copper oxide (YBCO) superconducting thin films, and as electrodes in ferroelectric memories. Other potential applications in Si based complementary metal oxide semiconductor (CMOS) devices are currently being studied. The search for alternative metal-based gate electrodes as a replacement of poly-Si gates has intensified during the last few … more
Access: Restricted to the UNT Community Members at a UNT Libraries Location.
Date: May 2006
Creator: Lim, ChangDuk
Partner: UNT Libraries

Interfacial Studies of Bimetallic Corrosion in Copper/Ruthenium Systems and Silicon Surface Modification with Organic and Organometallic Chemistry

Description: To form Cu interconnects, dual-damascene techniques like chemical mechanical planarization (CMP) and post-CMP became inevitable for removing the "overburden" Cu and for planarizing the wafer surface. During the CMP processing, Cu interconnects and barrier metal layers experience different electrochemical interactions depending on the slurry composition, pH, and ohmic contact with adjacent metal layers that would set corrosion process. Ruthenium as a replacement of existing diffusion barrier lay… more
Access: Restricted to the UNT Community Members at a UNT Libraries Location.
Date: August 2006
Creator: Nalla, Praveen Reddy
Partner: UNT Libraries
open access

Electrodeposition of Copper on Ruthenium Oxides and Bimetallic Corrosion of Copper/Ruthenium in Polyphenolic Antioxidants

Description: Copper (Cu) electrodeposition on ruthenium (Ru) oxides was studied due to important implications in semiconductor industry. Ruthenium, proposed as the copper diffusion barrier/liner material, has higher oxygen affinity to form different oxides. Three different oxides (the native oxide, reversible oxide, and irreversible oxide) were studied. Native oxide can be formed on exposing Ru in atmosphere. The reversible and irreversible oxides can be formed by applying electrochemical potential. Investi… more
Date: August 2007
Creator: Venkataraman, Shyam S.
Partner: UNT Libraries
open access

Synthesis and characterization of diphosphine ligand substituted osmium and ruthenium clusters.

Description: The kinetics for the bridge-to-chelate isomerization of the dppe ligand in H4Ru4(CO)10(dppe) have been investigated by UV-vis and NMR spectroscopies over the temperature range of 308-328 K. The isomerization of the ligand-bridged cluster 1,2-H4Ru4(CO)10(dppe) was found to be reversible by 31P NMR spectroscopy, affording a Keq = 15.7 at 323 K in favor of the chelating dppe isomer. The forward (k1) and reverse (k-1) first-order rate constants for the reaction have been measured in different sol… more
Date: August 2007
Creator: Kandala, Srikanth
Partner: UNT Libraries
open access

Rediscovery of the Elements: Ruthenium

Description: Article describing the discovery of platinum in Russia and the history of ruthenium. Tourist information regarding sites pertinent to this history are included.
Date: Summer 2009
Creator: Marshall, James L., 1940- & Marshall, Virginia R.
Partner: UNT College of Arts and Sciences
open access

Electrochemical Depostion of Bismuth on Ruthenium and Ruthenium Oxide Surfaces

Description: Cyclic voltammetry experiments were performed to compare the electrodeposition characteristics of bismuth on ruthenium. Two types of electrodes were used for comparison: a Ru shot electrode (polycrystalline) and a thin film of radio-frequency sputtered Ru on a Ti/Si(100) support. Experiments were performed in 1mM Bi(NO3)3/0.5M H2SO4 with switching potentials between -0.25 and 0.55V (vs. KCl sat. Ag/AgCl) and a 20mV/s scan rate. Grazing incidence x-ray diffraction (GIXRD) determined the freshly … more
Date: May 2012
Creator: Taylor, Daniel M.
Partner: UNT Libraries
open access

Synthesis, Kinetic Studies, and Structural Investigations of Osmium and Ruthenium Clusters

Description: Addition reactions of ten neutral nucleophiles and seven anionic nucleophiles with the pentaosmium pentadecacarbonyl carbido cluster Os5C(CO)15 have been kinetically studied and several important reactivity trends have been established. The calculated activation parameters support an associative mechanism involving the attack of nucleophiles on the parent cluster in the rate-limiting step. Decarbonylation reactions of neutral arachno clusters Os5C(CO)15L have also been kinetically studied and d… more
Date: July 2023
Creator: Nesterov, Volodymyr
Partner: UNT Libraries
Back to Top of Screen