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open access

High Temperature Water as an Etch and Clean for SiO2 and Si3N4

Description: An environmentally friendly, and contamination free process for etching and cleaning semiconductors is critical to future of the IC industry. Under the right conditions, water has the ability to meet these requirements. Water becomes more reactive as a function of temperature in part because the number of hydronium and hydroxyl ions increase. As water approaches its boiling point, the concentration of these species increases over seven times their concentrations at room temperature. At 150 °C, … more
Date: December 2018
Creator: Barclay, Joshua David
Item Type: Refine your search to only Thesis or Dissertation
Partner: UNT Libraries
open access

Degradation Mechanisms and Dynamics of Silicon Telluride: A Guide to the Effective Fabrication and Characterization of Silicon Telluride-Based Devices

Description: Silicon telluride (Si2Te3) and many other tellurium containing compounds show emergent Raman peaks located at ~120 cm-1 and ~140 cm-1 as they age. The origin of these two emergent peaks is controversial in the literature and has been attributed to myriad causes such as the intrinsic Raman modes of the telluride materials, surface oxidation, defects, double resonances, and tellurium precipitates. The controversial nature of these peaks has led to the misidentification of highly degraded materia… more
Date: December 2023
Creator: Hathaway, Evan Allen
Item Type: Refine your search to only Thesis or Dissertation
Partner: UNT Libraries
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