Sputtering of Bi and Preferential Sputtering of an Inhomogeneous Alloy
Description:
Angular distributions and total yields of atoms sputtered from bismuth targets by normally incident 10 keV -50 keV Ne+ and Ar+ ions have been measured both experimentally and by computer simulation. Polycrystalline Bi targets were used for experimental measurements. The sputtered atoms were collected on high purity aluminum foils under ultra-high vacuum conditions, and were subsequently analyzed using Rutherford backscattering spectroscopy. The Monte-Carlo based SRIM code was employed to simula…
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Date:
December 2014
Creator:
Deoli, Naresh T.
Partner:
UNT Libraries