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  Partner: UNT College of Arts and Sciences
 Department: Materials Science and Engineering
 Decade: 1980-1989
Rapid isothermal annealing of As-, P-, and B-implanted silicon

Rapid isothermal annealing of As-, P-, and B-implanted silicon

Date: June 15, 1984
Creator: Wilson, Scott R.; Paulson, W. M.; Gregory, R. B.; Hamdi, A. H. & McDaniel, Floyd Del. (Floyd Delbert), 1942-
Description: This article discusses rapid idothermal annealing of As-, P-, and B-implanted silicon.
Contributing Partner: UNT College of Arts and Sciences
Thermal annealing behavior of an oxide layer under silicon

Thermal annealing behavior of an oxide layer under silicon

Date: December 15, 1982
Creator: Hamdi, A. H.; McDaniel, Floyd Del. (Floyd Delbert), 1942-; Pinizzotto, Russell F.; Matteson, Samuel E.; Lam, H. W. & Malhi, S. D. S.
Description: This article discusses the thermal annealing behavior of an oxide layer under silicon.
Contributing Partner: UNT College of Arts and Sciences