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  Partner: UNT College of Arts and Sciences
 Decade: 1980-1989
 Year: 1982
 Month: December
 Collection: UNT Scholarly Works
Thermal annealing behavior of an oxide layer under silicon

Thermal annealing behavior of an oxide layer under silicon

Date: December 15, 1982
Creator: Hamdi, A. H.; McDaniel, Floyd Del. (Floyd Delbert), 1942-; Pinizzotto, Russell F.; Matteson, Samuel E.; Lam, H. W. & Malhi, S. D. S.
Description: This article discusses the thermal annealing behavior of an oxide layer under silicon.
Contributing Partner: UNT College of Arts and Sciences