Functionalization and characterization of porous low-κ dielectrics.
Description:
The incorporation of fluorine into SiO2 has been shown to reduce the dielectric constant of the existing materials by reducing the electrical polarizability. However, the incorporation of fluorine has also been shown to decrease film stability. Therefore, new efforts have been made to find different ways to further decrease the relative dielectric constant value of the existing low-k materials. One way to reduce the dielectric constant is by decreasing its density. This reduces the amount of p…
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Access:
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Date:
May 2005
Creator:
Orozco-Teran, Rosa Amelia