Thermal annealing behavior of an oxide layer under silicon
Description:
This article discusses the thermal annealing behavior of an oxide layer under silicon.
Date:
September 27, 1982
Creator:
Hamdi, A. H.; McDaniel, Floyd Del. (Floyd Delbert), 1942-; Pinizzotto, Russell F.; Matteson, Samuel E.; Lam, H. W. & Malhi, S. D. S.
Item Type:
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