Adhesion of Diamond Films on Tungsten
Description:
The U.S. Bureau of Mines has investigated the chemical vapor deposition of diamond films on tungsten substrates. The effects of deposition parameters on the adhesion of the films was determined. The films were produced using a hot filament chemical vapor deposition system. Parameters investigated were substrate temperature and methane concentration in the feed gas. Film quality, morphology, and composition were characterized by scanning electron microscopy and Raman spectroscopy.
Adhesion testiā¦
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Date:
1995
Creator:
Maggs, K. J.; Walkiewicz, J. W. & Clark, A. E.
Partner:
UNT Libraries Government Documents Department