Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate Page: 57
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E
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200
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E / V (vs Ag/AgCI)Figure 3.19 CV of oxidized (1.3V 180s) ruthenium electrode in 2mM Cu
(C104)2 + 10OmM KBr and 0.1 M HCIO4 as electrolyte; Scanrate =
20mV/s
600
400
N, 200
E
4 0
- -200
-400
-600
-0.2 -0.1 0.0 0.1 0.2 0.3 0 4 0.5
E/V (vs Ag/AgCI)
Figure 3.20 CV of oxidized (1.3V 180s) ruthenium electrode in 2mM Cu
(CIO4)2 + 20mM KBr and 0.1 M HCIO4 as electrolyte; Scanrate =
20mV/s57
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Huang, Long. Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate, thesis, December 2003; Denton, Texas. (https://digital.library.unt.edu/ark:/67531/metadc4416/m1/69/: accessed April 23, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; .