Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate Page: 43
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0.07
0.06 m 1.6
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m0.04 m 0
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0.02 0.4
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Conc. of CuSO4 I mM
Figure 3.6 Concentration of CuSO4 Vs bulk peak position and monolayer
Comparing the ruthenium electrode, the oxidized ruthenium electrode
behavior is similar but the data also has significant difference. First, the
monolayer of copper on oxidized ruthenium electrode is double as the
ruthenium electrode, which has the same electrode area. Second, the distance
between the bulk peak and UPD peak on the oxidized ruthenium electrode is
bigger than the ruthenium electrode, which is about 10OkJmol- more. Third, the
capacity of oxidized ruthenium electrode is bigger than the ruthenium
electrode because the background is almost ten times higher than ruthenium
electrode in 0.5M H2SO4.
3.3 pH effect on the UPD and bulk peak of oxidized ruthenium electrode
The pH of CuSO4 solution [4-6] is one of critical aspects to investigate the43
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Huang, Long. Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate, thesis, December 2003; Denton, Texas. (https://digital.library.unt.edu/ark:/67531/metadc4416/m1/55/: accessed April 24, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; .