Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate Page: 34
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50
E 0
0
=-50,
-100
-06.2 -0.1 0.0 0:1 0:2 0:3 0.4 0.5
E / V (vs Ag/AgCI)
Figure 2.16 CV of ruthenium electrode in 2mM Cu (CIO4)2 + 1mM KBr and 0.1
M HCIO4 as electrolyte; Scanrate = 20mV/s
50
E 0
-50
-100
-0.2 -0.1 0.0 -0.1 0.2 0.3 -0.4 0.5
E / V (vs Ag/AgCI)
Figure 2.17 CV of ruthenium electrode in 2mM Cu (CIO4)2 + 1mM KBr and 0.1
M HCIO4 as electrolyte; Scanrate = 20mV/s34
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Huang, Long. Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate, thesis, December 2003; Denton, Texas. (https://digital.library.unt.edu/ark:/67531/metadc4416/m1/46/: accessed April 24, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; .