Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate Page: 7
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E
E
switching time, X
tFigure 1.3 Potential-time profiles used for Cyclic Voltammetry (CV)
E
-10
0.
-10
-2000 0 0: 1 0:2 0:3 0 :4 0:5
E / V (vs Ag/AgCI)Figure 1.4 Cyclic Voltammetry of 4mM K3Fe (CN)6 on polycrystalline
Ruthenium electrode, 0.1M K2SO4 as electrolyte, Platinum foil as the CE,
Scanrate= 10OmV/s
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Huang, Long. Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate, thesis, December 2003; Denton, Texas. (https://digital.library.unt.edu/ark:/67531/metadc4416/m1/19/: accessed April 19, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; .